PLASSYS is a French company founded in 1987. Its main activity consists in designing and manufacturing equipment for thin film deposition and ion milling. For 30 years and counting, many prestigious public and private research centers have relied on PLASSYS expertise and know-how in vacuum technology and vacuum applications. As a testimony of our truly international presence, our customers are spread all over the world: France, USA, Russia, Canada, Japan, China, Germany, UK, etc.

PLASSYS’ range of product lines covers systems for thermal evaporation, electron beam evaporation, sputtering deposition, diamond growth by CVD, ion gun assisted deposition, and ion etching.

PLASSYS is also a supplier of small scale production systems. Our technology for thin films is mainly applied in semiconductor, superconductor, sensors, tribological and optical layers industries.

Legal form : Limited company
Capital : 198 900 EUR
Founded : 1987
Registration : R.C. Evry
SIRET : 412 341 893 00011
Address : 14, rue de la Gare, 91630 Marolles-en-Hurepoix, France
Phone : +33 (0)1 64 56 20 00
Fax : +33 (0)1 64 56 10 03
European VAT number : FR 17 412 341 893