Name : PLASSYS-BESTEK
Legal form : Limited company
Capital : 198 900 EUR
Founded : 1987
Registration : R.C. Evry
SIRET : 412 341 893 00011
Address : 14, rue de la Gare, 91630 Marolles-en-Hurepoix, France
Phone : +33 (0)1 64 56 20 00
Fax : +33 (0)1 64 56 10 03
Email : firstname.lastname@example.org
European taxes : FR 17 412 341 893
PLASSYS is a French company founded in 1987. Its main activity consists in designing and manufacturing equipment for thin film deposition and etching. For 30 years and counting, many prestigious public and private research centers have relied on PLASSYS expertise and know-how in vacuum technology and vacuum applications.
PLASSYS is also a supplier of production systems for DLC tribological films deposition by PECVD.
PLASSYS range of product lines covers systems for thermal evaporation, electron beam evaporation, sputtering deposition, diamond growth by CVD, ion gun assisted deposition, and ion etching.
PLASSYS technology for thin films is mainly applied in semiconductor, superconductor, sensors, tribological and optical layers industries.