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Plasma Etching

• Lab equipments for process development
• Small-sized reactors with front door
• Medium-sized cylindrical reactors with top lid
• Systems with loadlock
• Chlorinated, fluorinated, brominated gases
• Manual, automatic or computer controlled systems



• Automatic pumping unit

• Dry pump or vane pump
• Turbomolecular pump for corrosive gas application
• Pressure regulation



• Gases

• Gas lines with massflow controllers



• Etching monitoring

• Laser interferometer



• Substrate biasing

• 300 or 600W (13.6MHz)
• Pulsed plasma
• Automatic matching network
• Self-bias voltage measurements