Plasma Etching
- Lab equipments for process development
- Small-sized reactors with front door
- Medium-sized cylindrical reactors with top lid
- Systems with loadlock
- Chlorinated, fluorinated, brominated gases
- Manual, automatic or computer controlled systems
Automatic pumping unit
- Dry pump or vane pump
- Turbomolecular pump for corrosive gas application
- Pressure regulation
Gases
- Gas lines with massflow controllers
Etching monitoring
- Laser interferometer
Substrate biasing
- 300 or 600W (13.6MHz)
- Pulsed plasma
- Automatic matching network
- Self-bias voltage measurements
